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Plasma Dynamics is involved in the plasma processing of advanced materials.

Plasma Dynamics is devoted exclusively to the plasma processing of advanced materials by reactive ion etching (RIE) and plasma enhanced chemical vapor deposition (PECVD). The company was founded in 2003 by Dr. Vilnis Kreismanis. Company services include R&D, consulting on/and process development, as well as low level production. Plasma Dynamics clients include everything from Fortune 50 to small startup companies in the computer, biotech, photonics, failure analysis, advanced display and elec...

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Detailed Information
  • Location TypeSingle Location
  • Opening Date2003
  • Annual Revenue Estimate$500,000 to $1 million
  • SIC Code show
  • Employees1 to 4
  • Contactsshow
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